Principles of Lithography, Fourth Edition

This new edition of Principles of Lithography is long overdue, since there have been many advances in lithographic technology since the 3rd edition was published in 2010. Since the publication of that earlier edition, EUV lithography has progressed from research to the threshold of high-volume manufacturing. There are now additional insights into the concepts regarding line-edge roughness that were described in previous editions. Mask-making is evolving with the introduction of multi-beam mask writers. As in previous editions, I have tried to emphasize the fundamental principles of lithographic technology, without delving too deeply into particular advanced topics except where such subjects are commonly used by practicing lithographers.