Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Oluwatobi Adeleke & Sina Karimzadeh & Tien-Chien Jen
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
Категории:
Год:
2023
Язык:
english
Файл:
PDF, 40.19 MB
IPFS:
,
english, 2023
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